Z3TM+ 组合模块

The Z3TM+ is enlarging the portfolio of modules serving motion platforms. This module adds four independent degrees of freedom, namely Tip, Tilt, Theta and Z axes embedded inside an enlarged theta hollow shaft. One configuration includes a Z axis that now features a double stacked Z axis; one fine (FZ) and one coarse (CZ). By design, this optional module enables complete fulfillment of wafer motion profiles for advanced semiconductor applications, thus providing OEMs with a turn-key solution for any semiconductor technology. The product compactness establishes record density in terms of number of functions per volume, while its performance set new market standards for wafer level accuracies and dynamics. 

The Z3TM+ flexures based fine Z axis allows OEMs’ migration from expensive and obsolete piezoelectric solutions, eliminating their hysteresis problems while supporting nanometer level resolution, accuracy and repeatability, at even higher dynamics. With embedded support to proper sample alignment, the module then allows further control of wafers planarity, with respect to equipment heads, by means of its additional “tip” and “tilt” axes. Such unique functionality enables users with a next-level of process controls, for instance planarity, nominal Angle Of Incidence (AOI), focal plane straightness and many more, all of which result in unparalleled opportunity to yield wafer-level performance by the OEM technique. Today adopters not only simplify their design efforts for higher precision, moreover materialize dramatic reductions in equipment complexity, reliability, integration efforts and overall cost, thus enabling much faster time-to-market at improved price-per-performance ratios.

The Z3TM+ addition stems from ETEL continuous innovation and vertical integration, based on proprietary IP for motors, electronics and controlling know-how, and synergy with HEIDENHAIN when relating to world-class positioning accuracy feedback.


  • Double stacked Z axis: fine Z (±2 mm) and coarse Z (12 mm)
  • ±0.08°以上的摇摆和倾斜修正,以调整水平和提高运动和稳定时间
  • 卡盘面接真空
  • 兼容ISO 1级超净车间
  • 径向跳动误差 ±3.5 µm


运动行程±2 mm12 mm±0.08°364°
位置稳定性±3 nm±50 arcsec-±0.025 arcsec
双向重复精度±30 nm±7.5 µm-±2 arcsec
(100 µm, ±50 nm内)
60 ms --
(180°, ±40 µ°内)
- -450 ms


Modular / VHP
Z3TM+ with coarse Z / 请索取
Z3TM+ without coarse Z / 请索取