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Laser annealing

Achieving precise and uniform heating during laser annealing is a major challenge, essential for a consistent semiconductor process.

Ensuring optimum dopant distribution and minimising microcracks and dislocations are essential for the functionality of the components. To achieve homogeneous temperatures, the laser intensity and spot size as well as the motion system play a decisive role.

ETEL proposes motion solutions targeting speed stability and dynamic straightness to ensure the right amount of energy is applied at the right location.

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Motion systems

Do not hesitate to contact us to find out more about ETEL’s innovative and precise solutions.