Módulo combinado Z3TM+

The Z3TM+ is enlarging the portfolio of modules serving motion platforms. This module adds four independent degrees of freedom, namely Tip, Tilt, Theta and Z axes embedded inside an enlarged theta hollow shaft. One configuration includes a Z axis that now features a double stacked Z axis; one fine (FZ) and one coarse (CZ). By design, this optional module enables complete fulfillment of wafer motion profiles for advanced semiconductor applications, thus providing OEMs with a turn-key solution for any semiconductor technology. The product compactness establishes record density in terms of number of functions per volume, while its performance set new market standards for wafer level accuracies and dynamics. 

The Z3TM+ flexures based fine Z axis allows OEMs’ migration from expensive and obsolete piezoelectric solutions, eliminating their hysteresis problems while supporting nanometer level resolution, accuracy and repeatability, at even higher dynamics. With embedded support to proper sample alignment, the module then allows further control of wafers planarity, with respect to equipment heads, by means of its additional “tip” and “tilt” axes. Such unique functionality enables users with a next-level of process controls, for instance planarity, nominal Angle Of Incidence (AOI), focal plane straightness and many more, all of which result in unparalleled opportunity to yield wafer-level performance by the OEM technique. Today adopters not only simplify their design efforts for higher precision, moreover materialize dramatic reductions in equipment complexity, reliability, integration efforts and overall cost, thus enabling much faster time-to-market at improved price-per-performance ratios.

The Z3TM+ addition stems from ETEL continuous innovation and vertical integration, based on proprietary IP for motors, electronics and controlling know-how, and synergy with HEIDENHAIN when relating to world-class positioning accuracy feedback.


  •  Double stacked Z axis: fine Z (±2 mm) and coarse Z (12 mm)
  • Corrección tip-tilt sobre ±0.08° para nivelación y mejora de desplazamiento y estabilización
  • Paso de vacío hacia el nivel del plato
  • Compatible con sala limpia ISO1
  • Radial runout de ±3.5 µm


DescripciónZ finoZ amplioTip-TiltTheta
Recorrido±2 mm12 mm±0.08°364°
Estabilidad de posición±3 nm±50 arcsec-±0.025 arcsec
Repetitividad bidireccional±30 nm±7.5 µm-±2 arcsec
Tiempo de despl. y estabiliz.
(100 µm en ±50 nm)
60 ms --
Tiempo de despl. y estabiliz.
(180° en  ±40 µ°)
--450 ms

Pida el Manual de Integración correspondiente para más información.

DescripciónHoja de datos
Modular / VHP
Plano dimensionalModelo 3D
Z3TM+ with coarse Z / Bajo pedido
Z3TM+ without coarse Z / Bajo pedido