Stacked systems / platforms

Multi-axis configuration (XY, XYT, XYZ, XYZT and XYZ3T) can be easily provided based on off-the-shelf axes and modules.

 

 

ASME-NNNN-03-0490-0420xx-XY STACKED PLATFORM

XY Stacked System Vulcano

The Vulcano XY system is a three-piece-design allowing a compact and cost engineered solution, coupled to mechanical bearings and high-end optical encoders.

The baseplate of the bottom axes (Y1 & Y2) is composed of 2 ironcore linear motors, controlled in a gantry mode, when used with AccurET controllers, to allow better repeatability and optimal control efficiency. The upper axis (X) is composed of a single ironcore linear motor. The use of ironcore technology offers a high force density resulting in high acceleration and speed while keeping the operating temperature at a rather low level.

The baseplate of the upper axis (X), which also holds the motor of the bottom axes (Y1 & Y2) is made of aluminum for mass optimization and dynamics. Thermal expansion is handle by flexure elements.

There are 3 linear guides on the bottom plate. The two external linear guides laying on the bottom plate of VULCANO are recirculating ball bearings while the internal one (located in the middle of the baseplate) is composed of a recirculating roller bearing. The decoupling between the three guides is made through flexural elements. Some of these elements attached to the bearing blocks of the external guides allow a translation in the X direction. Some others attached to the central rail allow a rotation around the vertical direction. The upper axis (X) integrates 2 linear bearings. The decoupling is made via another set of flexural elements allowing a translation in the Y direction for one of the rail.

The use of this platform is suitable for, but not limited to:

  • Wafer Process Control applications such as Overlay Metrology, Critical Dimension and Thin film Metrology
  • Back-end: specific flip-chip processes made on large panels/substrates

Characteristics

  • Compact footprint
  • Nanometer position stability
  • Short move and settle times
  • High dynamics
  • High bidirectional repeatability
  • High position stability
  • ISO class 1 clean room compatibility

Ask for the corresponding Integration Manual for more information.

Main features

DescriptionY1-Y2 (bottom)X (upper)
Travel range490 mm420 mm
Maximum speed1.5 m/s1.5 m/s
Maximum acceleration25 m/s225 m/s2
Position stability±0.6 nm±0.7 nm
Bidirectional repeatability±0.25 µm
Move and settle time
(25 mm within ±100 nm)
125 ms110 ms
Maximum payload40 kg

 

 

DescriptionData sheetInterface drawing3D model
ASME-NNNN-03-0365-0355xxOn request
ASME-NNNN-03-0490-0420xxOn request

 

 

ASME-NNNN-04-0490-0420xx-XYT STACKED PLATFORM

XYT Stacked System Vulcano

The Vulcano XYT platform is made up of the standard Vulcano XY outfitted with the RTTB rotary module which includes high resolution encoder coupled to an outstanding mechanical bearing.

The use of this platform is suitable for, but not limited to:

  • Wafer Process Control applications such as Overlay Metrology, Critical Dimension and Thin film Metrology
  • Back-end: specific flip-chip processes made on large panels/substrates

Characteristics

  • Compact footprint
  • Nanometer position stability
  • Short move and settle times
  • High dynamics
  • High bidirectional repeatability
  • High position stability
  • ISO class 1 clean room compatibility

Ask for the corresponding Integration Manual for more information.

Main features

DescriptionY1-Y2 (bottom)X (upper)Theta
Travel range490 mm420 mm367°±2°
Maximum speed1.5 m/s1.5 m/s60 rpm
Maximum acceleration25 m/s225 m/s2169 rad/s2
Position stability±1.1 nm±0.8 nm±1.9 nm @ R=150 mm
Bidirectional repeatability±0.25 µm±0.3 arcsec
Move and settle time
(25 mm within ±100 nm)
135 ms120 ms-
Maximum payload--30 kg

 

 

DescriptionData sheetInterface drawing3D model
ASME-NNNN-04-0365-0355xxOn request
ASME-NNNN-04-0490-0420xxOn request

 

 

ASME-NNNN-09-0490-0420xx-XYZ3TH STACKED PLATFORM

XYZ3TH Stacked System Vulcano

The Vulcano XYZ3TH platform is made up of the standard Vulcano XY outfitted with the Z3TH combined module. This 4 degrees of freedom module, provides 364° Theta rotation, double Z-axes, a coarse one for wafer loading and unloading, and a fine one for focus adjustment, as well as a Tip and Tilt correction over ±0.1°. 

Characteristics

  • Compact footprint
  • Nanometer position stability
  • High dynamics: 2.5 g, 1.5 m/s
  • Low move and settle times
  • ISO1 clean room compatible
  • Tip-Tilt correction over ±0.1°
  • Double Z integration
  • Built-in gravity compensator in Z
  • Outstanding Z straightness
  • Enhanced Z repeatability and jitter
  • Ability to correct stage flatness
  • Built-in vacuum supply at chuck level

Ask for the corresponding Integration Manual for more information.

Main features

DescriptionY1-Y2 (bottom)X (upper)Fine ZTip-TiltCoarse ZTheta
Travel range490 mm420 mm±2 mm±0.1°16 mm364°
Maximum speed1.5 m/s1.5 m/s---10 rad/s
Maximum acceleration25 m/s225 m/s2---55 rad/s2
Position stability±0.6 nm±0.7 nm±1.9 nm±0.0043 arcsec-±0.0038 arcsec
Bidirectional repeatability±0.25 µm±0.010 µm--±0.35 arcsec
Move and settle time
(25 mm within ±100 nm)
125 ms110 ms----
Maximum payload2 kg

 

 

DescriptionData sheetInterface drawing3D model
ASME-NNNN-09-0365-0355-xxOn request
ASME-NNNN-09-0490-0420-xxOn request

 

 

ASME-NNNN-03-0365-0355xx-XYT STACKED SYSTEM

ASME-NNNN-03-0365-0355xx-XYT stacked system

The XYT stacked system, Charon, is a three axis Motion System featuring travels compatible with 300 mm wafers and integrating the RTTB super high resolution rotary axis. It can be sold as a standalone system or also further integrated on a granite base and active isolation system. This system is typically used in wafer process control in application such as Overlay, critical dimension and thin film metrology. It can also be used in all applications requiring repeatability in the micrometer range, and/or position stability in the nanometer range.

Main features

  • Total stroke: 365 mm x 355 mm
  • Position accuracy: ± 16 µm for XY and ± 3 arcsec for T
  • Bidirectional repeatability: ± 0.5 µm for XY and ± 0.3 arcsec for T
  • Position stability: ± 2.5 nm and ± 0.00259 arcsec for T
  • Payload: 2.5 kg
  • ISO 2 clean room compatible
  • Equipped with the super high resolution rotary axis

Ask for the corresponding Integration Manual for more information.

DescriptionData sheetInterface drawing3D model
ASME-NNNN-03-0365-0355xxOn request
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